For their project „EUV Lithography - New Light for the Digital Age“, Federal President Frank-Walter Steinmeier awarded the prize for technology and innovation to a team of experts from ZEISS, Semiconductor Manufacturing Technology (SMT) Division, TRUMPF Lasersystems for Semiconductor Manufacturing, and the Fraunhofer Institute for Applied Optics and Precision Engineering IOF in Jena in November. EUV stands for „extremely ultraviolet“, i.e. light with an extremely short wavelength. In this and the next decade, this unrivalled key technology will enable the production of far more powerful, energy-efficient and cost-effective microchips than ever before. „This is an absolutely future-oriented development and the prize is a clear signal for the outstanding scientific and technological achievements that are being made here in Thuringia,“ said Economics Minister Wolfgang Tiefensee, delightedly.
